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Book Understanding Key Molecular Properties in a CVD Process Feasibility Study: Design of Volatile Non-halogenated Precursors for the Chemical Vapor Deposition (CVD) of Copper

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Understanding Key Molecular Properties in a CVD Process Feasibility Study: Design of Volatile Non-halogenated Precursors for the Chemical Vapor Deposition (CVD) of Copper

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    Available in PDF - DJVU Format | Understanding Key Molecular Properties in a CVD Process Feasibility Study: Design of Volatile Non-halogenated Precursors for the Chemical Vapor Deposition (CVD) of Copper.pdf | Language: GERMAN
    Rolf Claessen(Author)

    Book details


Dieses Buch untersucht das Grundprinzip des Designs von Vorläufermolekülen für CVD Prozesse. Der Effekt von molekularen Eigenschaften dieser Moleküle auf den CVD Prozess wird sowohl experimentell als auch theoretisch erforscht. Eine neuartige Klasse von Liganden und resultierenden Komplexen wird als Beispiel für maßgeschneiderte Vorläufermoleküle für CVD Prozesse demonstriert. Haupteigenschaften wie z.B. thermische Zersetzung und Flüchtigkeit können unabhängig eingestellt werden und auf den indiviuellen CVD Prozess abgestimmt werden. This book examines the rationale of precursor design for a CVD (Chemical Vapor Deposition) process. The effect of molecular properties on the CVD process outcome is investigated experimentally and computationally. A novel class of ligands and resulting complexes is demonstrated as an example of tailormade precursors for CVD processes. Key properties such as thermal decomposition and volatility are shown to be independently tunable and can be adjusted to the individual process needs

Born 1972 in Cologne, Rolf Claessen received his Ph.D. in 2002 for his work on precursor design for CVD processes. He can be reached via email at books@claessen.netAdditional information and data may be obtained online at www.claessen.net/books.

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Book details

  • PDF | 212 pages
  • Rolf Claessen(Author)
  • Books On Demand (29 Aug. 2002)
  • German
  • 10
  • Science & Nature

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